PVD Systems
Physical Vapor Deposition or PVD is a high purity technique for the vacuum deposition of thin-film and nanoparticle coatings. Physical techniques such as sputtering and thermal evaporation (organic or inorganic) are used to generate a vapor of material. Material vapor generated by the source is carried to the substrate at low gas pressure. Upon contact with the substrate, the vapor condenses to form a thin-film. In the case of nanoparticles, metal vapor generated by sputtering condenses into nanoparticles in the gas phase before reaching the substrate. Nikalyte PVD systems can be used for thin-films, nanoparticles, multilayer stacks, composites etc. to grow unique functional materials.
Compact PVD systems
- Low cost, compact, flexible PVD system
- Cycle time under 45 minutes
- Models: 375 (5 sources, 4″ subs) , 300 (4 sources, 2″ subs)
- Front-loading chamber with CF ports, for up to 5 sources
- Upward or downward facing source configuration
- Integrated electronics, pumps, with automation software
UHV PVD systems
- UHV PVD system with load-lock and bakeout option
- Compatible with Nikalyte and third-party sources
- Confocal CF ports for up to 5 sources
- Substrate stage with rotation, heating, RF/DC biasing
- Fully automated, recipe-driven software
- Create high-purity nanoparticle–thin film composites
Modular PVD systems
- Front-loading, spacious chamber for easy access
- Upward or downward facing source configuration
- Sample stage with rotation, heating, and RF/DC biasing
- Supports flexible substrates, powder coating, reel-to-reel
- Fully automated, recipe-driven software
- Compatible with third-party sources
Benchtop Nanoparticle system
- Generate metallic/compound nanoparticles (oxides, nitrides)
- Deposit hydrocarbon-free, non-agglomerated nanoparticles
- Wide material selection: Au, Ni, Ir, Pt, and more
- Real-time deposition control via QCM
- Typical cycle time: 30 minutes
- Room temperature deposition for delicate substrates