UHV Magnetron Sputter Sources : Stellar
Nikalyte’s Stellar Sputter Sources deliver high-performance magnetron sputtering with remarkable flexibility and seamless integration. Fully compatible with all UHV systems, they are designed for user convenience, offering customizable in-vacuum lengths and target sizes.
Nikalyte’s Stellar Sputter Sources deliver high-performance magnetron sputtering, compatible with all UHV systems and offering bakeable capabilities up to 150°C standard; 250°C bakeable option available upon request. With excellent target utilization (up to 40%) and options for standard or high-strength magnets, these sources support balanced/unbalanced configurations. They feature easy target mounting with a bayonet clamp, manual or pneumatically controlled shutters, and are available in 1-inch, 2-inch, and 3-inch sizes. Customizable in-vacuum lengths, and compatible with DC, RF, Pulsed DC, and HiPIMS power supplies for added flexibility. They can be supplied individually or integrated into our NL-CUBE and custom-built NEXUS system.
Key Features
- Bakeable to 150°C standard; 250°C bakeable option available upon request. (no need to remove magnets)
- Excellent target utilization of up to 40%
- Standard and high-strength magnets for magnetic materials
- Options for balanced or unbalanced magnet configurations
- Simple bayonet clamp for straightforward target mounting
- Includes a choice between manual or pneumatically controlled shutter
- Available sputter target sizes: 1-inch, 2-inch, and 3-inch
- User-friendly design with easily exchangeable magnets
- Customizable in-vacuum length
- Compatible with DC, RF, Pulsed DC (unipolar or bipolar), and HiPIMS power supplies
Specifications
| Stellar Source | 1.0″ | 2.0″ | 3.0″ |
| Mounting Flange (CF (O.D.) | 4.5″ 114mm NW63CF | 6.0″ 152mm NW100CF | 6.0″ 152mm NW100CF |
| UHV compatible | Yes, Bakeable to 150°C; 250°C available on request. (no need to remove magnets) | ||
| In-vacuum length | 200mm or 300mm – special length on request | ||
| In-vacuum diameter of source head | 45mm | 72mm | 93mm |
| Target size | 1.0″ (25mm) | 2.0″ (50mm) | 3.0″ (75mm) |
| Target thickness (non-magnetic targets with standard magnets) | Up to 3mm | Up to 3mm | Up to 3mm |
| Target thickness (non-magnetic targets with strong magnets) | n.a. | Up to 7mm | Up to 7mm |
| Target thickness (magnetic targets with strong magnets) | Not available – 0.4mm with standard magnetics | Up to 1mm | Up to 2mm |
| Magnets | For magnetic or non-magnetic materials, balanced or unbalanced, easily exchanged by the user | ||
| Power supply | DC, RF, Pulsed DC (unipolar or bipolar), HiPIMS | ||
| Shutter | Integral manual or optional pneumatically operated | ||
| Cooling | Minimum water flow of 1 I/min | ||
Frequently Asked Questions
The Stellar series are compact, fully UHV-compatible circular magnetron sputter sources designed for high-performance thin-film deposition. Available in 1-inch, 2-inch, and 3-inch target sizes, they are bakeable to bakeable to 150°C, 250°C bakeable option available upon request without removing the magnets and are compatible with all standard UHV deposition systems.
The Stellar sources are compatible with DC, RF, Pulsed DC (both unipolar and bipolar), and HiPIMS power supplies. This broad compatibility makes them suitable for depositing metals, oxides, nitrides, and other compound thin films across a wide range of process conditions.
Yes. Standard and high-strength magnet options are available to accommodate both magnetic and non-magnetic target materials. For magnetic targets, the 2-inch and 3-inch sources with strong magnets support target thicknesses up to 1 mm and 2 mm respectively. Balanced and unbalanced magnet configurations are available, and magnets can be exchanged easily by the user without specialist tools.
The Stellar sources achieve target utilisation of up to 40%, which is notably high for circular magnetron sources of this size. This reduces material waste and lowers the cost per deposition run, particularly relevant when working with precious or rare materials.
The Stellar sources achieve target utilisation of up to 40%, which is notably high for circular magnetron sources of this size. This reduces material waste and lowers the cost per deposition run, particularly relevant when working with precious or rare materials.
Yes. The Stellar sources are designed for seamless integration into any UHV system via standard CF flanges.