Powder Coating System : PCS
Chemical-free technique for coating of powders and pellets with inorganic thin films and nanoparticles. PVD coatings provide repeatable coverage with excellent control over mass loading.
The NL-powder coating system consists of a compact vacuum chamber fitted with a vibratory bowl. Powders and pellets are loaded into the bowl to be coated with thin film or nanoparticles. Three different bowl capacities up to 2L are available. PVD is a chemical-free technique which uses high-purity metals and gases to produce high purity inorganic coatings with no chemical waste. The line-of-sight technique offers unform coverage. In situ measurement using a quartz crystal microbalance enables precise control over the mass loading and repeatable results with every run. The power coating system is provided with an integrated PC and SPECTRUM control software for automated recipe control and data logging.
Key Features
- Uniform and repeatable coatings
- Precise control over mass loading
- Inorganic thin film and nanoparticle coatings
- Chemical free coating with minimal residue
- In-situ plasma cleaning
- Up to 2 Litres capacity
- Typical materials, Pt, Ir2O3, CuO, Ru, Ni, NiO and many more
System Configuration
| Options | PCS100 | PCS250 | PCS400 |
| Size of Deposition Chamber | 150 x 150 x 300mm | 300 x 300 x 400mm | 450 x450 x 450mm |
| Bowl Diameter | Φ100mm | Φ250mm | Φ400mm |
| Max Bowl Weight | 0.34kg | 1.5kg | 3.8kg |
| Orientation | Sputter down | ||
| Capacity | 0.15 litre | 0.5 litres | 2 litres |
| Pumping | Oil pump or turbo pump backed by oil pump. Including soft start pumping and slow venting. | ||
| Control Software | Recipe driven processes, power supply control and data logging. Optional automated pumping sequencing (with pneumatic valves) | ||
| In-situ Monitoring | Quartz Crystal Microbalance for process monitoring and end point detection | ||
| Source Port | 2 deposition sources | Up to 4 deposition sources | Up to 5 deposition sources |
| Source Type | Nanoparticle source, Magnetron sputter sources, Ion source, RF Atom source | Nanoparticle source, Magnetron sputter sources, Ion source, RF Atom source | Nanoparticle source, Magnetron sputter sources, Ion source, RF Atom source |