Nikalyte NL-UHV : Alloy Nanoparticle Deposition
Deposit pure and alloy nanoparticles with precise control over size and composition
About the NL-UHV
The Nikalyte NL-UHV instrument range enables the generation and deposition of nanoparticles in Ultra-High vacuum on to your sample to create a functionalised surface. The properties of the nanoparticle coatings can be tailored through the precise control over the size, compositon and structure of the nanoparticles.
Unlike with chemical techniques, the NL-UHV range of instruments allows the direct deposition of ultra-pure nanoparticles onto a huge variety of substrates and materials. The film density can be tuned and the film itself can be highly adherent to the sample surface.
The NL-UHV is available with a single 1”, 2” source or a triple 1” source, the NL-DX3. The NL-DX3 allows the deposition of up to three materials either individually, or as alloys using two or three materials simultaneously.
For the ultimate in control of nanoparticle deposition, the Nikalyte NL-QMS mass filter allows the deposited nanoparticles to be scanned or filtered by mass or nanoparticle diameter in real-time, allowing you to optimise the growth conditions. The NL-QMS is controlled via our simple and intuitive WindowsTM software
Applications of the NL-UHV
Life Sciences & Nanomedicine
Cancer Therapies, Drug delivery, Antimicrobial, Antiviral, Biofilms
Graphene
Electronics, Energy, Composites, Sensors
Photonics
Photovoltaics, Light harvesting, Surface enhanced Raman
Catalysis
Fuel Cells, Photocatalysis, Electrochemistry, Water/air purification
Sensors
Biosensors, Optical, Electrical, Electrochemical, SERS
Deposition Source options
Choice of magnetron sources from single source options or triple head NL-DX3 source. All sources are compatible with dc or pulsed dc power supplies.
1 inch or 2 inch sources
.. deposition from single elemental or alloy target
.. high deposition rates upto mg/cm2/sec
DX3 - triple 1 inch source
..load three different materials at once
..generate alloy nanoparticles
..deposit alternate elemental nanoparticles
..independent operation of each target
NL-UHV Source Specifications
NL-D1 NL-D2 NL-DX3 Number of Sputter Targets 1 1 3 Sputter Target dimensions 1 inch (25.4mm)
0.5-3mm thick2 inch (50.6mm)
0.5-3mm thick1 inch (25.4mm)
0.5-3mm thickPower Supply 1 x 630V dc 1 x 630V dc 3 x 630V dc Source Output 75W dc 100W dc 3 x 75W dc
Nanoparticle deposition
Nanoparticles are formed in vacuum through a process called gas terminated deposition. Control the properties of the nanoparticle coatings by varying a range of process parameters, including gas flow, gas type, magnetron power and aggregation length (Lg) or through changing the aggregation zone aperture size.
Vary nanoparticle size distribution
..Nanoparticle size from 1 - 20nm
Vary nanocoating layer density
..Sub monolayer to 3D nanoporous coverage
..Loosely bound to hightly adherent coatings
Control nanoparticle structure
..Crystaline or amorphous structures
..Control over nanoparticle shape
Nanoparticle size control
When used in-line with the NL-UHV the NL-QMS can be used to analyse and further filter the nanoparticle beam. Switch easily between measurement and filter mode to optimize and then deposit tailored nanocoatings.
Measure in-flight mass spectra
..Analyse the mass spectrum of nanoparticles in flight
..Mass range of 100 - 10 6 amu
Filter nanoparticle size
..Select nanoparticle mass to pass through filter
..Mass resolution in filter mode is +/-2%
Intuitive software
..WindowsTM based software
..Data logging of mass spectra
..Preloaded mass calibration data for common materials
..Enter parameters for new materials or alloys
..Full control over QMS operation and scan settings
Ultra-pure nanoparticles
from a choice of materials
The NL-UHV utilises magnetron sputtering to generate a beam of ultra-pure nanoparticles in vacuum. Nanoparticles can be generated from any metal or conductive material.
Nanoparticle characteristics are:
Ultra pure and hydrocarbon free
Generated from 99.999% solid source material
Wide choice of inorganic materials, including Au, Ag, Cu, Pt, Ir, Ni, Ti, and Zr
No cross contamination when changing source materials
Generate compound nanoparticles such as nitrides and oxides
Technical information
| Utility | NL-DXX | NL-QMS |
|---|---|---|
| Mounting Flange | DN160CF | DN160CF |
| Power | 630V dc or pulsed dc | 100-250Vac 4Amp fuse |
| Gas | Argon/Helium 2-100Sccm | – |
| Cooling Jacket | Water or LN2 Flow rate 2l/min (0.52 US GPM) | – |
| Pumping | 120L/m (4.2 CFM) Backing pump 300L/m (10.6 CFM) Turbo pump | |
| Aperture plates | 2mm, 3mm, 4mm and 5mm aperture plates supplied as standard |