Deposit pure and alloy nanoparticles with precise control over size and composition
Applications of the NL-UHV
Deposition Source options
Choice of magnetron sources from single source options or triple head NL-DX3 source. All sources are compatible with dc or pulsed dc power supplies.
NL-UHV Source Specifications
NL-D1 NL-D2 NL-DX3
Number of Sputter Targets 1 1 3
Sputter Target dimensions 1 inch (25.4mm)
2 inch (50.6mm)
1 inch (25.4mm)
Power Supply 1 x 630V dc 1 x 630V dc 3 x 630V dc
Source Output 75W dc 100W dc 3 x 75W dc
Nanoparticles are formed in vacuum through a process called gas terminated deposition. Control the properties of the nanoparticle coatings by varying a range of process parameters, including gas flow, gas type, magnetron power and aggregation length (Lg) or through changing the aggregation zone aperture size.
Nanoparticle size control
When used in-line with the NL-UHV the NL-QMS can be used to analyse and further filter the nanoparticle beam. Switch easily between measurement and filter mode to optimize and then deposit tailored nanocoatings.
|Power||630V dc or pulsed dc||100-250Vac
|Cooling Jacket||Water or LN2|
Flow rate 2l/min (0.52 US GPM)
|Pumping||120L/m (4.2 CFM) Backing pump|
300L/m (10.6 CFM) Turbo pump
|Aperture plates||2mm, 3mm, 4mm and 5mm aperture plates |
supplied as standard