PVD Systems and Sources
Physical Vapor Deposition or PVD is a high purity technique for the vacuum deposition of thin-film and nanoparticle coatings. Physical techniques such as sputtering and thermal evaporation (organic or inorganic) are used to generate a vapor of material. Material vapor generated by the source is carried to the substrate at low gas pressure. Upon contact with the substrate, the vapor condenses to form a thin-film. In the case of nanoparticles, metal vapor generated by sputtering condenses into nanoparticles in the gas phase before reaching the substrate. Nikalyte PVD systems and instruments can be used for thin-films, nanoparticles, multilayer stacks, composites etc. to grow unique functional materials.
Sources
- Precise size and density control
- Sub-monolayer to 3D nanocoatings
- Nanoparticle size optimization via quadrupole mass filter
- Pure and alloy nanoparticles
- All sources are compatible with both DC and Pulsed DC power supplies
- Mini e-beam evaporator with co-evaporation
- Low heat load from cooled pocket enclosure
- Single-phase controlled co-evaporation
- Customizable in-vacuum length
- Ideal for depositing contacts for lithography
- Bakeable to 250°C without removing magnets
- Excellent target utilization (up to 40%)
- Compatible with DC, RF, Pulsed DC, and HiPIMS
- Customizable in vacuum length
- Three 1- inch targets
- Type 1, Type 2, balanced and strong magnets
- Bakeable to 250°C without removing magnets
- Excellent target utilization (up to 40%)
- Available sputter target sizes: 1-inch, 2-inch, and 3-inch
- Customizable in-vacuum length
- Compatible with DC, RF, Pulsed DC, and HiPIMS
- Type 1, Type 2, balanced and strong magnets
Systems
- Low cost, compact, flexible PVD system
- Cycle time under 45 minutes
- Models: 375 (5 sources, 4″ subs) , 300 (4 sources, 2″ subs) , NL-FLEX (bespoke with custom sizing)
- Upward or downward facing source configuration
- Integrated electronics, pumps, with automation software
- UHV PVD system with load-lock and bakeout option
- Confocal CF ports for up to 5 sources
- Substrate stage with rotation, heating, RF/DC biasing
- Fully automated, recipe-driven software
- Create high-purity nanoparticle–thin film composites
- Metallic/compound (oxides, nitrides) nanoparticles
- Hydrocarbon-free, non-agglomerated nanoparticles
- Wide material selection: Au, Ni, Ir, Pt, and more
- Real-time deposition control via QCM
- Typical cycle time: 30 minutes
- Room temperature deposition for delicate substrates
- Compact chamber with vibratory bowl
- Capacity options with bowls up to 2L
- Chemical-free, uniform and repeatable coatings
- Precise control over mass loading
- Inorganic thin film and nanoparticle coatings
- Automation with PC and SPECTRUM software