Nikalyte NL50: Direct Nanoparticle Deposition System

One touch benchtop nanoparticle deposition system

About the NL50

The Nikalyte NL50 benchtop system brings the possibility of depositing ultra-pure metallic nanoparticles to every research laboratory. Specifically designed to be easy and convenient to use, the NL50 is capable of routinely and repeatably depositing non-agglomerated nanoparticles on to samples of up to 50mm diameter.

Touchscreen operation makes the deposition process as simple as possible. Training for routine operation can take as little as 10 minutes. It also allows process variables to be modified to adjust parameters such as nanoparticle size, distribution and layer thickness.

Samples are loaded through the clear chamber door and can be plasma cleaned in the chamber before deposition. The source materials can be easily changed in under 5 minutes.

The vacuum deposition process produces ultra-pure nanoparticles that are free of hydrocarbons or other contamination, which typically plague chemical techniques. The nanoparticle coating is deposited straight onto your substrate and the after a typical cycle time of 30 minutes is ready for analysis; no further drying or purification steps are needed.

NL50 Desktop Nanoparticle Disposition System

Applications of the NL50

Life Sciences & Nanomedicine

Cancer Therapies, Drug delivery, Antimicrobial, Antiviral, Biofilms


Electronics, Energy, Composites, Sensors


Photovoltaics, Light harvesting, Surface enhanced Raman


Fuel Cells, Photocatalysis, Electrochemistry, Water/air purification


Biosensors, Optical, Electrical, Electrochemical, SERS

The NL50 compact design

NL 50 Particle Disposition System

Flip back magnetron lid

..quick material exchange

Nanoparticle generation zone

..ultra pure nanoparticles formed in vacuum

Sample Chamber

..easy sample loading
..view deposition through clear loading door

Touch Screen

..fully automated recipe control
..preloaded settings for common materials

Perfect for teaching and shared laboratories

The NL50 is ideally suited to a shared research or teaching laboratory, where it can be used by students and researchers in parallel on a diverse range of nanotechnology projects without fear of cross contamination.

Easy to use

..Intuitive user interface
..No previous vacuum experience required
..Optimised settings for common materials


..Wide choice of materials and substrate options
..Switch materials in minutes

No cross contamination

..No cross contamination of materials
..Use for a wide range of projects in parallel

Safe and Robust design

..Fully interlocked for safety
..Robust design protects expensive components

Ultra-pure nanoparticles
from a choice of materials

The NL50 utilises magnetron sputtering to generate a beam of ultra-pure nanoparticles in vacuum. Nanoparticles can be generated from any metal or conductive material.

Nanoparticle characteristics are:

Ultra pure and hydrocarbon free

Generated from 99.999% solid source material

Wide choice of inorganic materials, including Au, Ag, Cu, Pt, Ir, Ni, Ti, and Zr

No cross contamination when changing source materials

Generate compound nanoparticles such as nitrides and oxides

Deposition control

Real time deposition control using a Quartz Crystal Monitor (QCM) enables precise and repeatable control over surface loading from sub monolayer coverage to porous 3D structures. Deposition times are typically a few minutes.

Deposition Rates range from 10-50ng/cm2s

Easy to use

NL50 Control Panel

The intuitive user interface is easy to use and allows full automation of the pump down and deposition sequence.

Fully automated pump down and venting

Preloaded optimised deposition settings for common materials

Advanced users can control deposition conditions to vary the nanoparticle size and deposition rate

Choice of deposition control using deposited weight or deposition time

Quick material exchange

NL50 is the ideal multi-user tool. Switch from one material to another in under 5 minutes. The flip back lid design enables target exchange using only a small Pozi screwdriver. The flip-back lid allows full access to the sputter target without needing to remove the magnetron head

NL50 source top view

Surface cleaning and pre-treatment

The NL50 offers optional in-situ plasma cleaning of conducting substrates. In vacuum plasma cleaning removes adsorbed molecules from the substrate, in order to aid adhesion of the deposited nanoparticles and enable functionalisation of the substrate surface before deposition. For delicate substrates simply deselect the plasma cleaning step in the recipe.

Flexible Substrate loading

The NL50 is designed for a wide range of substrate types and sizes up to 50mm in diameter.

Even delicate substrates are suitable as no heat is generated in the deposition chamber.

Substrates include, but are not limited to:

microscope slides

petri dishes

micro-well plates




Other information


NL50 Weight: approx. 60Kg (113lbs)
NL50 Dimensions: (LXWXH) 70 x 50 x 60cm (27.6x 19.7 x 23.6 inches)


Target size: 1inch (25.4mm) diameter, max 3 mm thick.
Max Sample Size: 50mm diameter.
Materials: Conducting materials, including Ag, Au, Pt, Cu, Ni, Ti, Ir.


Power: Single phase IEC, AC@110-260v, 50-60hZ.
Gas: Argon (process gas), Nitrogen (vent gas), High pressure air (pneumatics), 6mm compression fittings.
Water flow: 2L/min (0.3 US GPM) 2x10mm compression fittings.
Pumping: DN25KF, 120L/m (7.2m3/h) backing pump required (provided as optional extra).

NL50 Dimentions
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