One touch benchtop nanoparticle deposition system
Applications of the NL50
The NL50 compact design
Real time deposition control using a Quartz Crystal Monitor (QCM) enables precise and repeatable control over surface loading from sub monolayer coverage to porous 3D structures. Deposition times are typically a few minutes.
Deposition Rates range from 10-50ng/cm2s
Quick material exchange
NL50 is the ideal multi-user tool. Switch from one material to another in under 5 minutes. The flip back lid design enables target exchange using only a small Pozi screwdriver. The flip-back lid allows full access to the sputter target without needing to remove the magnetron head
Surface cleaning and pre-treatment
The NL50 offers optional in-situ plasma cleaning of conducting substrates. In vacuum plasma cleaning removes adsorbed molecules from the substrate, in order to aid adhesion of the deposited nanoparticles and enable functionalisation of the substrate surface before deposition. For delicate substrates simply deselect the plasma cleaning step in the recipe.
Flexible Substrate loading
The NL50 is designed for a wide range of substrate types and sizes up to 50mm in diameter.
Even delicate substrates are suitable as no heat is generated in the deposition chamber.
Substrates include, but are not limited to:
NL50 Weight: approx. 60Kg (113lbs)
NL50 Dimensions: (LXWXH) 70 x 50 x 60cm (27.6x 19.7 x 23.6 inches)
Target size: 1inch (25.4mm) diameter, max 3 mm thick.
Max Sample Size: 50mm diameter.
Materials: Conducting materials, including Ag, Au, Pt, Cu, Ni, Ti, Ir.
Power: Single phase IEC, AC@110-260v, 50-60hZ.
Gas: Argon (process gas), Nitrogen (vent gas), High pressure air (pneumatics), 6mm compression fittings.
Water flow: 2L/min (0.3 US GPM) 2x10mm compression fittings.
Pumping: DN25KF, 120L/m (7.2m3/h) backing pump required (provided as optional extra).