multi-target

Graph illustrating Lift off process using E-beam deposition(adapted from Eschimese, D., Vaurette, F., Troadec, D., Leveque, G., Melin, T., and Arscott, S., "Size and shape control of a variety of metallic nanostructures using tilted, rotating evaporation and lithographic lift-off techniques," Scientific Reports, 9, 14058, 2019, DOI: https://www.nature.com/articles/s41598-019-44074-w

Lift-Off Process for Nanoscale Devices Using E-Beam Deposition

Blog / By

Image courtesy: Lift off process using E-beam deposition (adapted from Eschimese, D., Vaurette, F., Troadec, D., Leveque, G., Melin, T., and Arscott, S., “Size and shape control of a variety of metallic nanostructures using tilted, rotating evaporation and lithographic lift-off techniques,” Scientific Reports, 9, 14058, 2019, DOI: https://www.nature.com/articles/s41598-019-44074-w The lift-off process is one of the […]

Lift-Off Process for Nanoscale Devices Using E-Beam Deposition Read More »

Superior thin film Coatings with Multi-Target Sputtering

Blog / By

In thin film deposition, precision and control are critical for producing high-performance coatings that meet the rigorous demands of industries such as semiconductors, optics, and materials science. Multi-target sputtering, particularly systems with three target configurations, has emerged as a transformative solution to enhance deposition versatility, material composition, and process control. The Need for Multi-Target Sputtering

Superior thin film Coatings with Multi-Target Sputtering Read More »

Scroll to Top