Compact PVD systems : NL-CUBE
The NL Cube is a budget-friendly, compact PVD system that combines advanced deposition capabilities in one versatile unit. Using the Terminated Gas Condensation Technique, it enables precise nanoparticle deposition, ideal for creating functional coatings in research and development. In addition, the NL Cube offers the flexibility of a Mini E-Beam Evaporator for high-quality thin film deposition. Available in three models: the 375 (up to five sources, substrates up to 4 inches) and the 300 (up to four sources, substrates up to 2 inches), and NL-FLEX (bespoke model with custom sizing). It features rapid pump-down and turnaround in about 45 minutes. It is designed for cost-effective, high-performance use, with fast pump-down times and reliable functionality, making it an excellent choice for labs with limited space and budget.
Key Features
- Available sources include magnetrons, nanoparticle, mini-e-beam, thermal boat, atom and ion sources
- Sputter-up or sputter-down configurations
- Rotation, bias, and heating up to 800ºC options
- Turnaround ~ 45 minutes
- Vacuum down to 5E-7 torr
- System chassis containing control systems, power supplies and pumps
- Integrated PC with Spectrum software allows automated process control, complex recipes and datalogging
Cube System Configuration
| Cube 300 | Cube 375 | |
| Size of deposition chamber | 300 x 300 x 300 mm | 375x 375 x 375 mm |
| Base Pressure | < 1e – 6 Torr | < 5e – 7 Torr |
| Orientation | Sputter down / up | Sputter down / up |
| Sample table | 2-inch wafer, 20rpm rotation, RF/DC Bias and heating to 400oC | 4-inch wafer, 20rpm rotation, RF/DC Bias and heating to 800oC |
| Pumping | 80l/s turbo with 7.2m3/hr dry backing pump | 300l/s turbo with 7.2m3/hr dry backing pump |
| Valves | Manual / Automated Valves, Shutters, Linear drives and Pumping Baffle valve | Manual / Automated Valves, Shutters, Linear drives and Pumping Baffle valve |
| Control Software | Recipe driven processes, power supply control and data logging | Recipe driven processes, power supply control and data logging |
| In-situ monitoring | Quartz Crystal Microbalance for process monitoring and end point detection | Quartz Crystal Microbalance for process monitoring and end point detection |
| Source Port | Up to 4 deposition sources | Up to 5 deposition sources |
| Source Type | Nanoparticle source, Magnetron sputter sources, Mini e-beam evaporator, Thermal boat source K-cells, Ion source, RF Atom source | Nanoparticle source, Magnetron sputter sources, Mini e-beam evaporator, Thermal boat source K-cells, Ion source, RF Atom source |
| Uniformity | +/- 2% with sample rotation | +/- 2% with sample rotation |
Control Software
The intuitive “drag and drop” user interface is easy to use and allows full automation of the pump down and deposition sequences.
Features:
⇒ Recipe control
⇒ Configure Virtual Rack to suit your process
⇒ Easy to add and remove instruments
⇒ Real Time Charting
⇒ Interlock Monitoring
⇒ Data Logging Functions
Frequently Asked Questions
The NL-CUBE is a low-cost, compact PVD system that can combine nanoparticle and thin-film deposition in a single versatile unit. It uses the Terminated Gas Condensation technique for nanoparticle deposition and can be paired with a mini e-beam evaporator, or magnetron sputtering for thin-film work, making it suitable for research and development labs with limited space and budget.
The NL-CUBE is available in two standard models. The Cube 300 supports up to four deposition sources and substrates up to 2 inches. The Cube 375 supports up to five deposition sources and substrates up to 4 inches. A bespoke custom-sized model, the NL-FLEX, is also available for non-standard chamber requirements.
The NL-CUBE supports a range of sources including nanoparticle sources, magnetron sputter sources, mini e-beam evaporators, thermal boat sources, K-cells, ion sources, and RF atom sources. Sources can be configured in sputter-up or sputter-down orientation.
The NL-CUBE has a turnaround time of approximately 45 minutes from pump-down to deposition, achieving a base pressure down to 5×10⁻⁷ Torr, making it well suited for laboratories running frequent deposition cycles.
Yes. The sample table supports 20 rpm rotation with RF/DC bias for improved film uniformity. The Cube 300 heats substrates up to 400°C, while the Cube 375 heats substrates up to 800°C. Both configurations achieve film uniformity with +/- 2% with sample rotation.
The NL-CUBE is controlled through Nikalyte’s Spectrum software, which uses a drag-and-drop interface for full automation of pump-down and deposition sequences. Features include recipe-driven process control, a configurable virtual rack, real-time charting, interlock monitoring, and data logging.
Yes. For requirements outside the standard Cube 300 and Cube 375 configurations, Nikalyte offers the NL-FLEX, a bespoke modular PVD system built to custom sizing and source configurations.